| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface profile and/or film thickness measuring method and its apparatus for precisely measuring the surface profile etc. in a rugged state of a measuring object whose surface is covered with a transparent film. SOLUTION: By varying the distance of the surface of the measuring object, irradiating the reference surface and the measuring object surface or measuring object surface covered with the transparent film with white light from a white light source, an optical path difference is produced between the beams of reflected light reflected by the measuring object surface and the reference surface. An intensity value of their interference light generated then is sampled at predetermined intervals, and from the group of obtained intensity values their average value is found. Next, the thickness of the transparent film is found from the average value found by the actual measurement, on the basis of the correlation between the thickness of the transparent film and the average value of intensity values of interference light found previously concerning an object the same as the measuring object. Moreover, the surface height of the transparent film is derived by finding the peak position of the surface height of the measuring object surface, from a characteristic function formed by finding the characteristic value of the interference data from the intensity values. COPYRIGHT: (C)2005,JPO&NCIPI
|
