发明名称 Gated diode nonvolatile memory process
摘要 A gated diode nonvolatile memory cell with a charge storage structure includes a diode structure with an additional gate terminal. Various embodiments may include or exclude a diffusion barrier structure between the diode nodes. Example embodiments include the individual memory cell, an array of such memory cells, methods of operating the memory cell or array of memory cells, and methods of manufacturing the same.
申请公布号 US7419868(B2) 申请公布日期 2008.09.02
申请号 US20070619082 申请日期 2007.01.02
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 OU TIEN FAN;TSAI WEN JER;LAI ERH-KUN;KAO HSUAN LING
分类号 H01L21/8234 主分类号 H01L21/8234
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