PROCESS CHAMBER COMPONENT HAVING ELECTROPLATED YTTRIUM CONTAINING COATING,申请号KR20050030840-传众专利搜索

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发明名称	PROCESS CHAMBER COMPONENT HAVING ELECTROPLATED YTTRIUM CONTAINING COATING
摘要
申请公布号	KR100855531(B1)	申请公布日期	2008.09.01
申请号	KR20050030840	申请日期	2005.04.13
申请人		发明人
分类号	H01L21/02;C25D5/10	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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