METHOD FOR PREDICTING RESIST PATTERN SHAPE, COMPUTER READABLE MEDIUM STORING PROGRAM FOR PREDICTING RESIST PATTERN SHAPE, AND COMPUTER FOR PREDICTING RESIST PATTERN SHAPE

摘要

A method for predicting a resist pattern shape, a computer readable medium storing a program for predicting the resist pattern shape, and a computer for predicting the resist pattern shape are provided to improve the accuracy of resist pattern shape prediction by compensating a contour shape of an aerial image using a compensation amount. A light from a test pattern as a reticle pattern is projected onto a resist by a projection optical system and then a contour shape of a first aerial image being formed on the resist is calculated(S16). A shape of a resist pattern being formed by an exposure process and a development process using the test pattern is measured(S17). A compensation model representing a compensation amount and a feature amount of the contour shape is generated(S18). The compensation amount is determined according to a difference between the calculated contour shape and the measured shape of the resist pattern. A light from a certain pattern as the reticle pattern is projected onto a resist by the projection optical system and then a contour shape of a second aerial image being formed on the resist is calculated. The contour shape of the second aerial image is compensated by using a compensation amount with respect to the compensation model corresponding to the feature amount of the contour shape, so that a shape of a resist pattern corresponding to a certain pattern is predicted(S24).