发明名称 DISPLAY DEVICE AND MANUFACTURING METHOD OF SUBSTRATE FOR DISPLAY DEVICE
摘要 A display device and a method for manufacturing a substrate for the same are provided to suppress generation of coating unevenness caused by formation of other film pattern serving as underlying material when forming the film pattern by a spin coating method on the substrate for the display device, thereby providing the display device having superior display quality. A substrate(1) has a display area of an approximate rectangle. At least one film pattern(2,3) is formed on the substrate, and extended to the outside of the display area. A perimeter end part(42,43) of the at least one film pattern has a shape of a smooth curved line around at least one corner portion(5) of the display area. The perimeter end part of the film pattern has a waveform around the corner portion.
申请公布号 KR20080082913(A) 申请公布日期 2008.09.12
申请号 KR20080020361 申请日期 2008.03.05
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 KOYAMA HITOSHI
分类号 G02F1/1335;G02F1/1333 主分类号 G02F1/1335
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