发明名称 PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for suppressing moisture absorption of a body to be processed. SOLUTION: The plasma processing apparatus has a plasma processing chamber, a vacuum conveyance chamber, a lock chamber, and an atmosphere-side conveyance chamber, wherein the humidity in the atmosphere-side conveyance chamber is adjusted by introducing dry air into the atmosphere-side conveyance chamber. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009087992(A) 申请公布日期 2009.04.23
申请号 JP20070252100 申请日期 2007.09.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KOBAYASHI HIROYUKI;MAEDA KENJI;IZAWA MASARU
分类号 H01L21/3065 主分类号 H01L21/3065
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