发明名称 Methods of Forming Stacked Semiconductor Devices with Single-Crystal Semiconductor Regions
摘要 Spaced apart bonding surfaces are formed on a first substrate. A second substrate is bonded to the bonding surfaces of the first substrate and cleaved to leave respective semiconductor regions from the second substrate on respective ones of the spaced apart bonding surfaces of the first substrate. The bonding surfaces may include surfaces of at least one insulating region on the first substrate, and at least one active device may be formed in and/or on at least one of the semiconductor regions. A device isolation region may be formed adjacent the at least one of the semiconductor regions.
申请公布号 US2008200009(A1) 申请公布日期 2008.08.21
申请号 US20080029572 申请日期 2008.02.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LIM JONG-HEUN;HONG CHANG-KI;YOON BO-UN;BAE DAE-LOK;YUN SEONG-KYU;CHOI SUK-HUN
分类号 H01L21/46 主分类号 H01L21/46
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