| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a resist pattern in a second layer without a mixing with the resist pattern in a first layer in a patterning by a double exposure and a method for forming a pattern. <P>SOLUTION: The method for forming the pattern has (1) a process forming a first pattern on a substrate by using the resin composition for forming a first resist layer, (2) a process inactivating the first pattern to a light and (3) a process forming a second resist layer on the substrate forming the first pattern by using the resin composition for forming the second resist layer and exposing a required region. The method for forming the pattern also has (4) a process forming a second pattern in the space section of the first pattern by development. The resin composition for forming the second resist layer contains a resin as an alkali solubility by the working of an acid and a solvent, and the solvent does not dissolve the first resist pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT |
