SUBSTRATE SUPPORTING DEVICE, SUBSTRATE SUPPORTING METHOD, SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING COMPONENT FOR DISPLAY DEVICE, INSPECTING DEVICE, AND INSPECTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device that can keep processing accuracy and stably convey and process a substrate, and to provide a substrate supporting device or the like.

SOLUTION: The substrate processing device 1 is provided with a convey area air-pressure suspending device 11, a processing area air-pressure suspending device 13 and a convey area air-pressure suspending device 15 in a convey area 51, a processing area 53 and a convey area 55, respectively. The processing area air-pressure suspending device 13 has higher required accuracy and smaller quantity of suspension for a substrate 3 as compared with the convey area air-pressure suspending device 11 and the convey area air-pressure suspending device 15. Any level difference is provided among the processing area air-pressure suspending device 13, the convey area air-pressure suspending device 11 and the convey area air-pressure suspending device 15, according to the quantity of suspension for the substrate 3. The respective devices are assembled in a manner that the heights of the upper surfaces of the convey area air-pressure suspending device 11 and the convey area air-pressure suspending device 15 may be lower by a difference in suspension quantity for the substrate 3, as compared with that of the upper surface of the processing area air-pressure suspension device 13.

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