| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a design method for mask pattern in which an auxiliary pattern for improving a focal depth of an isolated pattern is arranged, with respect to a mask of performing exposure by using a light source having a direction dependence for resolution. <P>SOLUTION: The method of designing a mask pattern used upon exposure having the direction dependency for resolution by using an eight-point light source includes: a step of producing a dummy data 11 of a polygonal shape having two edges which form vortices in the neighborhood of respective vortices of an isolated rectangular pattern 1 and an edge inclined in 45°directions from the two edges; and a step of arranging the auxiliary pattern 2 which adjoins the vortices and has a prescribed positional relation with the dummy data 11. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
