| 摘要 |
The invention relates to film coating vacuum application. The inventive method consists in alternately carrying out pulse plasma generation by sputtering a cathode target, depositing a substance on a substrate for a time t<SUB>1</SUB> and in exposing, in a time slice ?, the coating to the action of a pulse high-power ion beam. The inventive method also consists in forming, a stationary magnetron discharge plasma in vacuum and in precipitating a coating with the aid of a high-current high-voltage diffusion discharge which is formed by passing magnetron discharge current pulses, the density of which ranges from 0.3 to 100 A/cm<SUP>2</SUP>, the length t<SUB>1 </SUB>of which<SUB/>is equal to 10<SUP>-6</SUP>...1 and a spacing frequency ranges from single to 10<SUP>3</SUP> Hz, through the stationary plasma. In addition, the slice time ? is selected in such a way that it is greater that the plasma recombination of the high-current high-voltage diffusion discharge in the space of a sputtering chamber and the pulse energy of the pulse beam action is equal to or less than 10<SUP>6</SUP> eV. Simultaneously, a secondary particle current is suppressed during the acceleration time with the aid of a high-voltage breakdown suppression device incorporated into a pulsed beam ion generator. Said invention makes it possible to accelerate the coating rate, to influence the coating properties and to increase the coating adhesion to the substrate. |
