发明名称 Super self-aligned collector device for mono-and hetero bipolar junction transistors, and method of making same
摘要 The invention relates to a process of forming a compact bipolar junction transistor (BJT) that includes forming a self-aligned collector tap adjacent the emitter stack and an isolation structure. A base layer is formed from epitaxial silicon that is disposed in the substrate.
申请公布号 US7414298(B2) 申请公布日期 2008.08.19
申请号 US20030633055 申请日期 2003.07.31
申请人 INTEL CORPORATION 发明人 AHMED SHAHRIAR;BOHR MARK;CHAMBERS STEPHEN;GREEN RICHARD
分类号 H01L29/06;H01L21/331;H01L21/8249;H01L27/06;H01L29/08 主分类号 H01L29/06
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