| 摘要 |
An embodiment of the invention is directed to a method for determining an anterior or posterior surface parameter of an ophthalmic correcting surface (e.g., custom contact lens "CCL," customized IOL, custom inlay, customized corneal surface) from a wavefront aberration measurement of an eye. A preferred embodiment relates to determining an anterior surface parameter of a dry, CCL designed to operate at 555nm. An algorithm sets forth the method comprising misalignment correction, chromatic aberration correction, and pow er shift correction due to differences between aberration measurement wavelengt h and peak vision wavelength, and differences between aberration measurement location and aberration correction location. A device readable medium is the preferable vehicle for the algorithm.
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