发明名称 |
Storage capacitor having a scattering effect and method of manufacturing the same |
摘要 |
A storage capacitor having a scattering effect is positioned in a substrate for use in a thin film transistor array loop. The storage capacitor is characterized by having a rough layer overlapped by a medium layer and a passivation layer. The storage capacitor further has a reflective layer with high reflectivity so as to provide the storage capacitor with the scattering effect toward an external light source. A method of manufacturing the storage capacitor by two photolithography processes is also shown.
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申请公布号 |
US7414824(B2) |
申请公布日期 |
2008.08.19 |
申请号 |
US20050908149 |
申请日期 |
2005.04.28 |
申请人 |
WISTRON OPTRONICS CORPORATION |
发明人 |
HSU HUNG-HUEI |
分类号 |
G02F1/1368;H01G4/228;G02F1/136;G02F1/1362;H01G4/008;H01L21/77;H01L21/8242;H01L27/12;H01L27/13 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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