TITANIUM OXIDE-BASED SPUTTERING TARGET FOR TRANSPARENT CONDUCTIVE FILM, METHOD FOR PRODUCING SUCH FILM AND COMPOSITION FOR USE THEREIN

摘要

The present invention is directed to a composition consisting essentially of: a) from about 80 to about 99 moie% of TiO2, and b) from about 1 to about 20 mole % of one or more materials selected from the group consisting of i) WO2, ii) Ta2O5, iii) Nb2O5, iv) MoO2, v) Mo, vi) Ta, vii) Nb, viii) W and ix) mixtures thereof, wherein the mole %s are based on the total product and wherein the sum of components a) and b) is 100. The invention is also directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.