发明名称 Method of fabricating suspended structure
摘要 A substrate having a sacrificial layer and a structural layer disposed on the front surface of the substrate is provided. Thereon an opening is formed on the back surface of the substrate and the sacrificial layer is exposed partially. A wet etching process is performed to etch the sacrificial layer via the opening to form a suspended structure. Finally, a gas injection process is performed. The gas injection process comprises blowing a gas on the suspended structure via the opening and consequently preventing the suspended structure from sticking to the substrate.
申请公布号 US7410821(B2) 申请公布日期 2008.08.12
申请号 US20060277150 申请日期 2006.03.22
申请人 TOUCH MICRO-SYSTEM TECHNOLOGY INC. 发明人 CHOW YAO-TIAN;LIU PIN-TING
分类号 H01L21/00 主分类号 H01L21/00
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