发明名称 |
Semiconductor device test structures and methods |
摘要 |
Semiconductor device test structures and methods are disclosed. In a preferred embodiment, a test structure includes a feed line disposed in a first conductive material layer, and a stress line disposed in the first conductive material layer proximate the feed line yet spaced apart from the feed line. The stress line is coupled to the feed line by a conductive feature disposed in at least one second conductive material layer proximate the first conductive material layer. |
申请公布号 |
US2008185584(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
US20070702975 |
申请日期 |
2007.02.06 |
申请人 |
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发明人 |
WALTER WOLFGANG;KOLLER KLAUS |
分类号 |
H01L23/58;H01L21/4763;H01L21/66 |
主分类号 |
H01L23/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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