| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for colored layer formation showing excellent developability, specifically a new radiation sensitive composition for colored layer formation capable of forming a fine pattern without causing chipping and undercut of a pattern edge even under low exposure energy, or leaving undissolved matter or generating scum on a pattern edge in development, thereby forming a color filter having high color purity and a black matrix having high light blocking effect. <P>SOLUTION: The radiation sensitive composition comprises (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator, wherein the alkali-soluble resin (B) has a structure obtained by adding an unsaturated monocarboxylic acid or a polybasic acid anhydride to a styrene epoxy resin. The radiation sensitive composition is used for forming a colored layer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
