| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing occurrence of defects and forming a resist pattern of a good profile, and a resist pattern forming method using the same. <P>SOLUTION: The photosensitive resin composition comprises (a) a polyfunctional epoxy resin and (b) a cationic polymerization initiator, wherein the concentration of propylene carbonate in the photosensitive resin composition is ≤10 mass%. The photosensitive resin composition is capable of suppressing the occurrence of defects and forming a resist pattern of a good profile. <P>COPYRIGHT: (C)2008,JPO&INPIT |
