| 摘要 |
A liquid sealing unit is provided. The liquid sealing unit includes a storage vessel for containing a liquid and having an optical nozzle hole through which light can be transmitted, and a sealing part for containing a fluid in contact with the liquid contained in the optical nozzle hole. An immersion photolithography apparatus having the liquid sealing unit is also provided. Therefore, it is possible to substantially prevent contamination of an immersion projection optical system.
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