发明名称 FRAG SHIELD
摘要 <p>Fabric laminates having superior resistance to penetration of fragments, such as shrapnel. The fabrics are formed of high-strength fibers consolidated with from about 7% to about 15% by weight of an elastomeric matrix composition, and in combination with protective layers of a polymer film on each surface of the fabric. The fabrics achieve a significant improvement in fragment resistance compared to fabrics of the prior art, while also maintaining excellent ballistic resistant properties.</p>
申请公布号 KR20080072932(A) 申请公布日期 2008.08.07
申请号 KR20087015279 申请日期 2006.11.17
申请人 HONEYWELL INTERNATIONAL INC. 发明人 BHATNAGAR ASHOK;WAGNER LORI L.;TAN CHOK BIN C.;ARVIDSON BRIAN;MURRAY LIN;HURST DAVID
分类号 F41H5/04;B32B5/28 主分类号 F41H5/04
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