发明名称 METHOD OF PROTECTING FRONT SURFACE STRUCTURE OF WAFER AND METHOD OF WAFER DIVIDING
摘要 A method of protecting front surface structure of a wafer and method of wafer dividing is provided. Initially, a wafer having a plurality of device disposed on a front surface thereof is provided. A protective layer is formed on the front surface of the wafer and a first bonding layer is provided to bond the wafer to a carrier. Subsequently, a wafer dividing process is performed to form a plurality of dies. After that, the first bonding layer and the protective layer are removed to separate the dies individually.
申请公布号 US2008188061(A1) 申请公布日期 2008.08.07
申请号 US20070762036 申请日期 2007.06.12
申请人 CHEN CHIH-HSIEN 发明人 CHEN CHIH-HSIEN
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址