| 摘要 |
An apparatus for manufacturing a semiconductor device is provided to simplify a dopant implantation process by implanting dopants only on an upper surface of a focus ring. An apparatus for manufacturing a semiconductor device includes a chamber and a focus ring(150). Plasma is generated in the chamber. The focus ring is formed in the chamber. Dopants are implanted on the focus ring. A chuck supports a substrate. The focus ring is formed to be apart from the chuck by the constant distance at an edge of the chuck. The dopant is one of the elements selected from the group consisting of P, As, Sb, B, Al, Ga, and In. The focus ring is made of one of Si, SiC, a crystal, and a ceramic.
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