发明名称 Thin film transistor, display device and their production
摘要 The present method prevents malfunctions in switching caused by a light leakage current in an active matrix type thin film transistor substrate for a liquid crystal display and prevents display failures, by selectively disposing a self assembled monolayer film in a gate electrode-projected region of the surface of an insulator film with high definition, and by selectively improving the orientation order of an organic semiconductor film only in the gate electrode-projected region without improving the order at an irradiated portion with light outside the gate electrode-projected region.
申请公布号 US7407846(B2) 申请公布日期 2008.08.05
申请号 US20070672908 申请日期 2007.02.08
申请人 HITACHI, LTD. 发明人 ANDO MASAHIKO;WAKAGI MASATOSHI;SASAKI HIROSHI
分类号 H01L21/00;H01L51/05;H01L21/336;H01L21/84;H01L29/786;H01L51/00;H01L51/30;H01L51/40 主分类号 H01L21/00
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