| 摘要 |
A method and an apparatus for treating a substrate are provided to improve a process efficiency of the substrate treating apparatus by effectively removing organic pollutants from a substrate surface during a peeling process. A substrate treating apparatus includes a peeling unit(120), a rinsing unit(130), a drying unit(140), and a UV(Ultra-Violet) cleaning unit(150). The peeling unit supplies a peeling solution on a substrate to peel off pollutants from a substrate surface. The rinsing unit rinses off the peeling solution, which remains on the substrate surface. The drying unit sprays a drying gas on the substrate to dry the substrate. The UV cleaning unit irradiates a UV ray on the substrate surface. The peeling unit, the rinsing unit, the drying unit, and the UV cleaning unit sequentially process the substrate.
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