发明名称 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>Disclosed is an exposure apparatus (EX) comprising a first sensing device (31) for sensing the temperature of a liquid (LQ) after being in contact with a certain body, and a processing device for detecting the relationship between the temperature of the liquid (LQ) and the temperature of the body based on the temperature sensed by the first sensing device (31).</p>
申请公布号 KR20080071552(A) 申请公布日期 2008.08.04
申请号 KR20087008388 申请日期 2008.04.07
申请人 NIKON CORPORATION 发明人 SHIRATA YOUSUKE
分类号 H01L21/027 主分类号 H01L21/027
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