| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dry film which is useful for pattern formation of a radiation-sensitive resin composition layer, which requires high-accuracy fine working, and which gives a radiation-sensitive resin composition layer excellent in surface smoothness and resolution. <P>SOLUTION: The dry film 1 includes a base film 2 of 10-50 μm thickness with a surface having a three-dimensional ten-point average roughness SRz of ≤2.2 μm and a three-dimensional maximum height SRmax of 4.0 μm, a radiation-sensitive resin composition layer 3 of 2-200 μm thickness stacked on the surface of the base film 2, and a cover film 4 to cover the radiation-sensitive resin composition layer 3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
