发明名称 MANUFACTURING METHOD OF ELEMENT SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an element substrate where a metal layer having a fine pattern is formed precisely. SOLUTION: The manufacturing method of the element substrate 100 includes: a process for forming a sacrifice layer having a first pattern on a substrate 10; a process for forming a metal layer at the upper portion of the formation and non-formation regions of the sacrifice layer; and a process for forming a metal layer 34 having a second pattern by removing the sacrifice layer by heating. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008177488(A) 申请公布日期 2008.07.31
申请号 JP20070011652 申请日期 2007.01.22
申请人 SEIKO EPSON CORP 发明人 KANEDA TOSHIHIKO;KIMURA SATOSHI;FURUHATA HIDEMICHI;AMAKO ATSUSHI;SAWAKI DAISUKE;KIJIMA TAKESHI
分类号 H05K3/18;G02F1/1343;H01L21/3205;H05K3/20 主分类号 H05K3/18
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