发明名称 |
MANUFACTURING METHOD OF ELEMENT SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an element substrate where a metal layer having a fine pattern is formed precisely. SOLUTION: The manufacturing method of the element substrate 100 includes: a process for forming a sacrifice layer having a first pattern on a substrate 10; a process for forming a metal layer at the upper portion of the formation and non-formation regions of the sacrifice layer; and a process for forming a metal layer 34 having a second pattern by removing the sacrifice layer by heating. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008177488(A) |
申请公布日期 |
2008.07.31 |
申请号 |
JP20070011652 |
申请日期 |
2007.01.22 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KANEDA TOSHIHIKO;KIMURA SATOSHI;FURUHATA HIDEMICHI;AMAKO ATSUSHI;SAWAKI DAISUKE;KIJIMA TAKESHI |
分类号 |
H05K3/18;G02F1/1343;H01L21/3205;H05K3/20 |
主分类号 |
H05K3/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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