摘要 |
A photoelectric conversion device includes a p-type layer, an i-type layer and an n-type layer each made of a silicon base semiconductor, stacked in this order, wherein the i-type layer contains n-type impurities in a concentration of 1.0x10<SUP>16 </SUP>to 2.0x10<SUP>17 </SUP>cm<SUP>-3</SUP>.
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