| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding stand where the reduction of a film deposition range can be suppressed even when a glass substrate having high thermal expansion is used, and to provide a film deposition method using the same. SOLUTION: In a substrate holding stand 7 where, when a thin film is deposited on the surface of a glass substrate 2, the glass substrate 2 is held to a standing state, a left side supporting part 22 and a right side supporting part 23 having a prescribed clearance and performing the positioning in the width direction of the glass substrate 2 are provided, these left side supporting part 22 and the right side supporting part 23 are provided with claw parts 22a, 23a to prevent the falling-down of the glass substrate 2 in such a manner that they are superimposed on the left and right edge parts of the glass substrate 2, respectively, and further, in the left side supporting part 22 and the right side supporting part 23, the length of the claw part 22a in the left side supporting part 22 to which the glass substrate 2 is pushed aside is set so as to be shorter than the claw part 23a in the right side supporting part 23. COPYRIGHT: (C)2008,JPO&INPIT
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