INTEGRATED CIRCUIT SYSTEM EMPLOYING DIFFERENTIAL SPACERS

摘要

INTEGRATED CIRCUIT SYSTEM EMPLOYING DIFFERENTIAL SPACERS An integrated circuit system that includes: providing a substrate with an NFET device and a PFET device; forming an NFET first liner and an NFET first spacer over the NFET device; forming a PFET first liner and a PFET first spacer over the PFET device; forming a punch-through suppression layer within a PFET source/drain; forming an NFET differential spacer; and forming a PFET differential spacer. FIG. 10