发明名称 |
Movable radiant heat sources |
摘要 |
A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.
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申请公布号 |
US2008175571(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20070655556 |
申请日期 |
2007.01.19 |
申请人 |
AGGARWAL RAVINDER;STOUTJESDIJK JEROEN |
发明人 |
AGGARWAL RAVINDER;STOUTJESDIJK JEROEN |
分类号 |
F26B19/00 |
主分类号 |
F26B19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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