POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF

摘要

The present application relates to a polymer having the formula (I) where R₃₀, R₃₁, R₃₂, R₃₃, R₄₀, R₄₁, R₄₂, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions.