| 摘要 |
<P>PROBLEM TO BE SOLVED: To apply a correction material with high accuracy on a surface of a test object while observing the surface of the test object with a high magnification in a defect correction apparatus. <P>SOLUTION: The defect correction apparatus 100 includes an observation optical system for performing enlargement observation of a pattern formed on the surface of a substrate 11, a discharge section 16 having a discharge nozzle 16a for discharging the correction material for correcting the defect of the pattern formed on the surface of the substrate 11, and a laser irradiation optical system for irradiating the surface of the substrate 11 with on light 32 subjected to beam shaping. The observation optical system and the laser irradiation optical system have a common optical system 10 on a substrate 11 side and the discharge nozzle 16a of the discharge section 11 is fixed and provided within the objective optical system 10 or on the outside on the substrate 11 side of the objective optical system 10. <P>COPYRIGHT: (C)2008,JPO&INPIT |
