发明名称 Semiconductor base material and method of manufacturing the material
摘要 <p>A semiconductor base comprising a sapphire substrate and an Al x Ga4 1-x-y In y N (0‰ x‰ 1, 0‰ y‰ 1, 0‰ x+y‰ 1) crystal layer grown on the substrate, characterized in that the sapphire substrate has a crystal growth plane, the crystal growth plane having a concavo-convex surface, and during growth of the crystal layer, facet structure growth occurs from the concave part of the concavo-convex surface, due to which, the crystal layer contains above the concave part a dislocation line that is bent at a position higher than the top part of the convex part.</p>
申请公布号 EP1947684(A1) 申请公布日期 2008.07.23
申请号 EP20080004987 申请日期 2001.09.17
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 OKAGAWA, HIROAKI;TADATOMO, KAZUYUKI;OUCHI, YOICHIRO;TSUNEKAWA, TAKASHI
分类号 H01L21/205;C30B25/02;C30B25/18;C30B29/38;C30B29/40;H01L21/02;H01L21/20;H01L33/22;H01L33/32;H01S5/323 主分类号 H01L21/205
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