发明名称 |
Semiconductor base material and method of manufacturing the material |
摘要 |
<p>A semiconductor base comprising a sapphire substrate and an Al x Ga4 1-x-y In y N (0‰ x‰ 1, 0‰ y‰ 1, 0‰ x+y‰ 1) crystal layer grown on the substrate, characterized in that
the sapphire substrate has a crystal growth plane, the crystal growth plane having a concavo-convex surface, and
during growth of the crystal layer, facet structure growth occurs from the concave part of the concavo-convex surface, due to which, the crystal layer contains above the concave part a dislocation line that is bent at a position higher than the top part of the convex part.</p> |
申请公布号 |
EP1947684(A1) |
申请公布日期 |
2008.07.23 |
申请号 |
EP20080004987 |
申请日期 |
2001.09.17 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION |
发明人 |
OKAGAWA, HIROAKI;TADATOMO, KAZUYUKI;OUCHI, YOICHIRO;TSUNEKAWA, TAKASHI |
分类号 |
H01L21/205;C30B25/02;C30B25/18;C30B29/38;C30B29/40;H01L21/02;H01L21/20;H01L33/22;H01L33/32;H01S5/323 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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