| 摘要 |
<p>A high temperature fine particle aluminum heater is provided to extend the duration by providing an excellent performance of an aluminum fluoride film. A substrate support for a semiconductor processing system includes an aluminum body(102), a heating element(106), and an axle(104). The aluminum body has an average grain size less than 250 um. The heating element is embedded in the aluminum body. The axle is engaged with a bottom portion of the aluminum body by fully penetrated lap weld joint. The heating element includes a lead(108) extending in the axle. A ceramic guide portion is disposed in a lift pin hole. The aluminum body has a grain enhancer or a titanium particle enhancer. The aluminum body is cast or forged.</p> |
