| 摘要 |
<p>A system for accumulating exposure energy information of a wafer and a Method for managing an exposure mask using exposure energy information accumulated by the same are provided to detect an immediate cause of pollution of a make such as haze. A method for managing an exposure mask using exposure energy information of a wafer comprises the steps: stacking a plurality of exposure masks on a mask stage of a plurality of exposure devices; reading an ID of the exposure masks at each of exposure devices and sending the read ID to a data server through a network line; outputting an optical generation signal from exposure devices to a plurality of light sources after sensing the ID; receiving the exposure optical energy from light sources to exposure devices through a plurality of optical transferring systems in accordance with a light generating signal for exposing the wafers through the exposure masks, measuring exposure energy at exposure devices and sending the exposure energy value to a data server; outputting exposure masks from each mask stage; accumulating each exposure energy data for the plural exposure masks if output finish information is outputted from the exposure devices to the data server; managing the accumulated exposure energy data at the data server; and outputting accumulated exposure energy valued for each mask to allow a mask inspector to know.</p> |
