| 摘要 |
A CVD(Chemical Vapor Deposition) diamond synthesis apparatus for uniform coating on a grain base metal is provided to fix a substrate on which grains are laid, using a substrate supporter and to incline a vacuum vessel during the diamond synthesis so as to rotate the substrate supporter and to move the grains of the base metal, thereby enabling the uniform diamond deposition on the grains of the base metal. A CVD diamond synthesis apparatus comprises a CVD diamond synthesis vessel(1), and an inclination device. The CVD diamond synthesis vessel has a rotary substrate supporter. The inclination device inclines the vessel so that a surface of supporting a substrate(10) of the substrate supporter is inclined with regard to a reference surface. The inclination device includes a tower part(2) combined with at least one side of the vessel, a support part(3) connected with the tower part, and an assistant device(4) combined with at least one side of the vessel. An angle between a rotary shaft(L) of the substrate supporter and a vertical shaft(M) of the reference surface is 0 to 45°.
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