METHOD AND SYSTEM FOR EVALUATING AN EVALUATED PATTERN OF A MASK

摘要

A method and a system for evaluating an evaluated pattern of a mask are provided to enhance efficiency by improving a complicated image processing scheme of images including a plurality of pixels. A receiving and calculating process is performed to receive or calculate multiple moments as an image of an evaluated pattern(130). The multiple moments are processed in order to determine at least one shape parameter of the evaluated pattern(140). A size of information for representing the multiple moments is practically smaller than a size of pixel information for forming the image of the evaluated pattern. The processing of the multiple moments includes the determining of moment differences between the multiple moments of the evaluated pattern and multiple nominal moments. The multiple nominal moments represent an image of a nominal pattern.