发明名称 ADHESIVE SHEET FOR PROCESSING SEMICONDUCTOR SUBSTRATE
摘要 <p>An adhesive sheet for processing a semiconductor wafer is provided to realize a stable drop in adhesion after the irradiation of UV rays or radiation beams, to prevent defects in the following pick-up step, and to leave no paste residue on the surface of a resin. An adhesive sheet for processing a semiconductor wafer comprises: a substrate transmittable to UV rays and/or radiation beams, and an adhesive layer polymerizable and curable by UV rays and/or radiation beams, wherein the adhesive layer is formed by using a multi-functional acrylate oligomer and/or monomer having a double bond, and is combined to have one double bond and a total average molecular weight of 225-8000 as calculated from the weight average molecular weight of the combination of the multi-functional acrylate oligomer and/or monomer.</p>
申请公布号 KR20080064744(A) 申请公布日期 2008.07.09
申请号 KR20080001319 申请日期 2008.01.04
申请人 NITTO DENKO CORPORATION 发明人 YAMAMOTO AKIYOSHI;SHINTANI TOSHIO;ASAI FUMITERU;HASHIMOTO KOUICHI
分类号 C09J133/08;C09J7/02;C09J133/00 主分类号 C09J133/08
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