| 摘要 |
<p>An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate comprises a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light, an optical system for guiding the light from said light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope and a spectroscope for dispersing the reflected lights guided by said optical system into a spectrum. Furthermore, it comprises an image sensor for observing the light dispersed by said spectroscope, an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate on the basis of information obtained by said image sensor, characterized in that said analyzer is adapted to analyze a first distance as a distance between the surface of the mold and a surface formed at a position away from the surface of the mold on the basis of information obtained from lights emitted from said light source and reflected by the surface of the mold and the surface formed at the position away from the surface of the mold. In addition, said analyzer is adapted to analyze a second distance as a distance between the surface formed at the position away from the surface of the mold and the surface of the substrate on the basis of information obtained from lights emitted from said light source and reflected by the surface formed at the position away from the surface of the mold and the surface of the substrate. Moreover, said analyzer is adapted to calculate the distance between the surface of the mold and the surface of the substrate by subtracting the first distance from the second distance.</p> |
