| 摘要 |
<p>An illumination apparatus, an exposure apparatus, and a method for exposing a film on a display panel are provided to enhance the reliability of exposure by preventing illuminance deviation of beams using a splitter. An illumination apparatus includes an optic source(100) and a splitter. The optic source radiates parallel lights. The splitter separates the parallel lights from the optic source into plural lights. The splitter includes a multi array lens unit(220) and plural light guides(231,232,233,234). The multi array lens unit separates the parallel lights radiated from the optic source into plural lights and focuses the separated lights. The light guides guide each light focused by the multi array lens units and radiate the guided lights.</p> |
