发明名称 COMPOSITE STRUCTURE FOR MICROLITHOGRAPHY AND OPTICAL ARRANGEMENT
摘要 <p>A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (Mg2Al4Si5O18) or of silicon carbide (SiC). Also disclosed is an optical arrangement, in particular a projection illumination apparatus for microlithography, having at least one such composite structure, preferably a wafer stage.</p>
申请公布号 EP1940748(A2) 申请公布日期 2008.07.09
申请号 EP20070786597 申请日期 2007.08.07
申请人 CARL ZEISS SMT AG 发明人 EKSTEIN, CLAUDIA;HOLDERER, HUBERT
分类号 C04B37/00;G03F7/20;H01L21/67;H01L21/683 主分类号 C04B37/00
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