发明名称 Enhanced alumina layer produced by CVD
摘要 The present invention introduces a new and refined method to produce alpha-Al<SUB>2</SUB>O<SUB>3 </SUB>layers with substantially better wear resistance and toughness than the prior art. The alpha-Al<SUB>2</SUB>O<SUB>3 </SUB>layer of the present invention is formed on a bonding layer of (Ti,Al)(C,O,N) with increasing aluminium content towards the outer surface. Nucleation of alpha-Al<SUB>2</SUB>O<SUB>3 </SUB>is obtained through a nucleation step being composed of both aluminising and oxidisation steps. The alpha-Al<SUB>2</SUB>O<SUB>3 </SUB>layer according to this invention has a thickness ranging from 1 to 20 mum and is composed of columnar grains. The length/width ratio of the alumina grains is from 2 to 12, preferably 5 to 9. The layer is characterised by a strong (012) growth texture, measured using XRD, and by the almost total absence (104), (110), (113) and (116) diffraction peaks.
申请公布号 US7396581(B2) 申请公布日期 2008.07.08
申请号 US20060514246 申请日期 2006.09.01
申请人 发明人
分类号 B32B9/00;C23C16/02;C23C16/40;C23C16/44;C23C16/455;C23C30/00 主分类号 B32B9/00
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