发明名称 VACUUM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment device, sure in pushing of a substrate, and capable of surely controlling a distance between the substrate and a discharging electrode whereby capable of improving stabilized quality of products and productivity. SOLUTION: The vacuum treatment device 1 includes a counter electrode 2 provided so as to retain the substrate 8 and the discharging electrode 3 provided so as to be opposed to the counter electrode 2 with a space while an electrode surface 23 opposed to the substrate 8 for the discharging electrode 3 includes a distance retaining board 25 for retaining the distance between the substrate 8 and the surface of discharging electrode 3 when the counter electrode 2 and the discharging electrode 3 are approached. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008153378(A) 申请公布日期 2008.07.03
申请号 JP20060338820 申请日期 2006.12.15
申请人 MITSUBISHI HEAVY IND LTD 发明人 WADA TAKAYUKI;KAWAMURA KEISUKE;TAKEUCHI YOSHIAKI;TAGASHIRA KENJI
分类号 H01L21/205;C23C16/458 主分类号 H01L21/205
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