| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device with which a sufficient pattern image can be obtained while a substrate is scanned and focus depth is enlarged in a state where a normal of the substrate is inclined with respect to an optical axis. <P>SOLUTION: The exposure device includes a lighting optical system 20 for lighting a reticle arranged on a face to be lighted with luminous flux from a light source 10, a projection optical system 40 for projecting a pattern of the reticle on the substrate and a stage 60 driving the substrate. The lighting optical system has a light distribution forming part 200 for forming light intensity distribution following a scanning direction of the reticle on the face to be lighted so that it becomes trapezoidal and making angle distribution of light lighting respective points of the face to be lighted to be equal. The substrate is exposed by light intensity distribution formed by the light distribution forming part and angle distribution of light while stage inclines the normal of the substrate with respect to the optical axis of the projection optical system and the substrate is driven. <P>COPYRIGHT: (C)2008,JPO&INPIT |
