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发明名称
Method for manufacturing fine pattern of a semiconductor device
摘要
申请公布号
KR100843870(B1)
申请公布日期
2008.07.03
申请号
KR20060066319
申请日期
2006.07.14
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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