SACRIFICIAL SPACER PROCESS AND RESULTANT STRUCTURE FOR MEMS SUPPORT STRUCTURE

摘要

Disclosed is a microelectromechanical systems (MEMS) device and method of manufacturing the same. MEMS such as an interferometric modulator include a sidewall spacer (844) formed adjacent to a movable mirror (840). The sidewall spacer (844) may be a sacrificial spacer that is removed during fabrication, or it may remain in the final product. Increased clearance (885) is provided between the movable mirror (840) and a support structure (880) during actuation of the movable mirror (840), thereby avoiding contact during operation of the interferometric modulator. The deformable layer (870) may be deposited in a more continuous fashion over the contour of a lower layer as determined by the contour of the sidewall spacer (844), resulting in a stronger and more resilient deformable layer (870).