发明名称 SUBSTRATE FILM FOR DICING
摘要 PROBLEM TO BE SOLVED: To provide a substrate film for dicing, where cut refuse (thread-shaped or whisker-shaped refuse generated from the film after dicing) scarcely occurs in the dicing process of a semiconductor wafer, and to provide a dicing film. SOLUTION: In the substrate film for multilayer dicing, a first layer includes a resin composition made of 30-80 wt.% of styrene-butadiene copolymer (SEBS) and 20-70 wt.% of polypropylene-based resin (PP); a second layer includes a resin composition made of 10-70 wt.% of polypropylene-based resin (PP) and 30-90 wt.% of amorphous olefin; and a third layer includes a thermoplastic resin having rubber elasticity, where the first to third layers are laminated in this order. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008153504(A) 申请公布日期 2008.07.03
申请号 JP20060341224 申请日期 2006.12.19
申请人 GUNZE LTD 发明人 SAGO SHIGERU;YOKOI MASAYUKI;OKAGAWA MASAAKI
分类号 H01L21/301;C09J7/02 主分类号 H01L21/301
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