| 摘要 |
A substrate treatment apparatus is provided to exhaust the acid and the alkali separately by connecting an exhaust tube to an exhaust pipe, and disposing a valve on the exhaust tube. A substrate treatment unit(101) comprises a spin head which rotates a substrate, a bowl(120) which surrounds the spin head, an exhaust duct(130) which is disposed within the bowl, and a first and a second exhaust pipes which are disposed within the exhaust duct. An exhaust processing unit(102) comprises a first and a second exhaust tubes which are connected with the first and second exhaust pipes respectively, a third exhaust tube which is connected with the first and second exhaust tubes, and comprises a vacuum pump, and a fourth and a fifth exhaust tubes which are separated from the third exhaust tube.
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